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Title:An effect of sodium dodecylsulfate on the corrosion of copper in sulphuric acid media
Authors:ID Fuchs-Godec, Regina (Author)
ID Doleček, Valter (Author)
Files:URL http://dx.doi.org/10.1016/j.colsurfa.2004.05.015
 
Language:English
Work type:Unknown
Typology:1.01 - Original Scientific Article
Organization:FKKT - Faculty of Chemistry and Chemical Engineering
Abstract:The effect of sodium dodecylsulfate (SDS) on copper corrosion in a solution of 0.5 M H2SO4 + x M SDS was studied using electrochemical polarisation measurements. The critical micelle concentration (CMC) of SDS in 0.5 M H2SO4 is 8 * 10-4 M, and the experimental concentrations of SDS were in the range below and above the CMC. It was found that SDS is a good anodic inhibitor at lower anodic overpotentials, i.e. very close to the rest potential. Adsorptionof the inhibitor obeys the Langmuir isotherm. Plots of log [▫$theta$▫/(1-▫$theta$▫)] versus log ▫$c_{inh}$▫ yielded straight lines with a slope change at the CMC. Accordingly, the CMC could be determined from these electrochemical measurements. The values of ▫$Delta$▫▫$G_{ads}$▫ calculated from the Langmuir plots are negative, suggesting that the inhibitive action of SDS in 0.5 M H2SO4 results from the electrostatic adsorption of C12H25SO4- ions onto the positively charged copper surface.
Keywords:electrochemistry, corrosion inhibitors, surfactants, potentiodynamic polarisation, corrosion kinetic parameters, copper, Langmuir isotherm, critical micelle concentration, sulphuric acid
Year of publishing:2004
PID:20.500.12556/DKUM-27529 New window
UDC:541.183
ISSN on article:0927-7757
COBISS.SI-ID:8985110 New window
NUK URN:URN:SI:UM:DK:FCW2LLKG
Publication date in DKUM:01.06.2012
Views:2065
Downloads:113
Metadata:XML DC-XML DC-RDF
Categories:Misc.
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Record is a part of a journal

Title:Colloids and surfaces
Shortened title:Colloids surf., A Physicochem. eng. asp.
Publisher:Elsevier
ISSN:0927-7757
COBISS.SI-ID:15328517 New window

Secondary language

Language:English
Title:A effect of sodium dodecylsulfate on the corrosion of copper in sulphuric acid media
Keywords:elektrokemija, korozijski inhibitorji, površinsko aktivne snovi, potenciodinamska polarizacija, baker, Langmuirjeva izoterma, kritična micelna koncentracija, korozijski kinetični parametri, žveplova (VI) kislina


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